Electron beam evaporation
Electron beam evaporation is a method of vacuum evaporation coating, which is developed on the basis of tungsten wire evaporation. The evaporation material is directly heated by electron beam under vacuum condition to vaporize and transport to the substrate, and then condense on the substrate to form a thin film. In the electron beam heating device, the heated material is placed in a water-cooled crucible, which can avoid the reaction between the evaporation material and the crucible wall and affect the quality of the film. Therefore, the electron beam evaporation deposition method can prepare high-purity film, and at the same time, multiple crucibles can be placed in the same evaporation deposition device to realize simultaneous or separate evaporation and deposition of a variety of different substances. Any material can be evaporated by electron beam evaporation. Electron beam is a kind of high-speed electron flow. At present, electron beam evaporation is a mature and main coating method in vacuum coating technology. It solves the problem of direct contact and easy mixing between coating material and evaporation source material in resistance heating mode.
Electron beam evaporation
Body with longitudinal beam scanning
The system with spray gun and full digital beam sweeper for single, multi pocket and large capacity crucible in thick layer.
Custom gun source with crucible turret system for special applications and extended product time between source maintenance.
电子束蒸发可以蒸发高熔点材料，比一般电阻加热蒸发热效率高、 束流密度大、蒸发速度快，制成的薄膜纯度高、质 量好，厚度可以较准确地控制，可以广泛应用于制备高纯薄膜和导电玻璃等各种光学材料薄膜。电子束蒸发的特点是不会或很少覆盖在目标三维结构的两侧，通常只会沉积在目标表面。这是电子束蒸发和溅射的区别。
Ion assisted evaporation (IAD)
Ion source technology can provide lower process temperature, shorter process time and enhanced film performance for Photonics and optoelectronics applications.
Electron beam evaporation can evaporate high melting point materials, which has higher thermal efficiency, higher beam density and faster evaporation speed than ordinary resistance heating evaporation. The prepared films have high purity, good quality, and can be controlled accurately. It can be widely used to prepare high-purity films, conductive glass and other optical materials.
The characteristic of electron beam evaporation is that it does not or rarely covers both sides of the target three-dimensional structure, and usually only deposits on the target surface. This is the difference between electron beam evaporation and sputtering.
It is commonly used in semiconductor research and industry. The accelerated electron energy is used to strike the material target and make it evaporate. Finally, it's deposited on the target.
Using advanced electron gun evaporation and ion assisted deposition (IAD) technology, Zhicheng Technology Series electron beam evaporation optical coating machine provides film deposition and etching for precision optics, optoelectronics and semiconductor fields.
From dielectric film and metal film, to TCO film and other compounds, we can design according to customers' requirements, and prepare products with excellent thickness uniformity and the strictest optical, mechanical and environmental reliability.
Zhicheng Technology provides you with complete solutions, including process and substrate fixture on the platform, with proven production reliability and the best cost advantage.