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PVD技术磁控溅射技术电子束蒸发DLCHIPIMSPACVDCVD

高能脉冲磁控溅射(HiPIMS)
技术特点:

高能脉冲磁控溅射技术是利用较高的脉冲峰值功率和较低的脉冲占空比来产生高溅射金属离化率的一种磁控溅射技术。将高能冲击磁控溅射与高压脉冲偏压技术复合,利用其高离化率和淹没性的特点,通过成膜过程中入射粒子能量与分布的有效操控,实现高膜基结合力、高品质、高均匀性薄膜的制备。该装备系统将在卫星通讯、等离子物理、新材料等领域具有重要的工业应用价值。

High energy pulsed magnetron sputtering (hipims)

Technical features:

High energy pulsed magnetron sputtering is a kind of magnetron sputtering technology which uses high peak power and low duty cycle to produce high metal ionization rate. High energy impact magnetron sputtering and high-voltage pulse bias technology are combined to make use of the characteristics of high ionization rate and submergence. Through the effective control of the energy and distribution of incident particles in the film forming process, high film substrate adhesion, high quality and high uniformity films are prepared. The equipment system will have important industrial application value in satellite communication, plasma physics, new materials and other fields.

领域:
工模具高温涂层:汽车、航空航天、军事等先进制造行业应用
稀土铝耐蚀薄膜:NdFeB磁铁行业环保涂层应用
太阳能薄膜:光伏发电及新能源领域应用
生物工程薄膜:生物医用领域应用

Field:

High temperature coating for tools and dies: application in advanced manufacturing industries such as automobile, aerospace, military, etc

Rare earth aluminum corrosion resistant film: application of environmental protection coating in NdFeB magnet industry

Solar film: application in photovoltaic power generation and new energy field

Bioengineering films: biomedical applications

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