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PVD技术磁控溅射技术电子束蒸发DLCHIPIMSPACVDCVD

PACVD 又叫 PECVD (离子强化气相沉积)

PACVD 离子加强化学气相沉积是在高度真空环境,温度低于 200 ℃的情况下,沉积极度光滑,粘着性能好的无定形金刚石硬质合金涂层。相对 PVD 工艺, PaCVD 工艺应用深镀电源,无需阴极靶材,同时工件在炉膛中无需旋转,该工艺为干净无污染,可靠,和多性能的涂层工艺。

PACVD is also called PECVD (ion enhanced vapor deposition)

PACVD ion enhanced chemical vapor deposition (ICVD) is a kind of amorphous diamond cemented carbide coating with extremely smooth and good adhesion under the condition of high vacuum and temperature below 200 ℃. Compared with PVD process, PACVD process uses deep plating power supply, without cathode target and workpiece rotation in furnace. This process is clean, pollution-free, reliable and multi-performance coating process.

 

PACVD 离子加强化学气相沉积是在高度真空环境,温度低于 200 ℃的情况下,沉积极度光滑,粘着性能好的无定形金刚石硬质合金涂层。

PACVD ion enhanced chemical vapor deposition (ICVD) is a kind of amorphous diamond cemented carbide coating with extremely smooth and good adhesion under the condition of high vacuum and temperature below 200 ℃.

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